Use of CF4:

1. Used in plasma etching process of various integrated circuits, also used as laser gas, used as coolant of cryogenic refrigerants, solvents, lubricants, insulating materials and infrared detector tubes.

2. The dosage in the microelectronics industry is the largest plasma etching gas, methane four fluorine high purity gas and four fluorine high purity, high purity oxygen mixture gas, methane can be widely used in silicon, silica, silicon, phosphorus silicon nitride thin film material such as glass and tungsten etching, in electronic components surface cleaning, the solar cell production, laser technology, cryogenic refrigeration, leak test, prin