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Tel: 86-27-82653381
Fax: 86-27-82629459
Mobile Phone: 86-13667126861
E-mail: vicky@nrdgas.com
SKP: vickyy8930
MSN: vickyy8930@hotmail.com
Address: Room 803, Chuangye Building,
Special No. 1, Jiangda Road, Jiang'an ,
Wuhan , Hubei China (Mainland)
Zip: 430000
High pruity gas

We provide Octafluorocyclobutrane (Halocarbon C318)(C4F8) in a variety of purities and concentrations. See the chart below and ask the customer service for the spec sheets and safety data sheets for more information on buying halocarbon – c318 (octafluorocyclobutrane) tanks and cylinders from Newradar Gas.

Additional information:
Octafluorocyclobutane is a nonflammable, colorless, odorless liquefied compressed gas package in cylinders under its own vapor pressure of 25 psig at 70 °F. This product can cause rapid suffocation when concentrations are sufficient to reduce oxygen levels below 19.5%. Self Contained Breathing Apparatus (SCBA)may be required for rescue workers. Contact with product can cause frostbite.

Details:

Molecular Weight: 

200.03

Safety Data 

Vapor Pressure
Data 

 

 

Specific Volume: 

1.87cf/lb@NTP

Nontoxic ¨C
Simple Asphxiant

Temp (Deg. F)

Pressure (psia)

 

Boiling Point: 

176°F(-8°C) @1 atm

 

32

17.4

 

CAS No.: 

115-25-3

 

70

39.7

 

Hazards:

Asphyxiant

 

 

 

 

 

DOT Label:

Green, Nonflammable Gas

UN Number: 

UN 1976

 

DOT Class: 

2.2

 

Cylinder: 

Steel Alloy

 

 

Cylinder

DOT

Cylinder
Dimension

Average Tare
Weight

Average Internal
Volume

Contents

Size 

Specification 

(in.) 

(lbs) 

(ft3)(L) 

(lbs) 

200

3AA2265

9x51

119

1.55   (43.9)

85

 

GRADE 

TECHNICAL 

RESEARCH 

Electronic 

 

 

Critical Assay

99.6% Weight

99.90%

100.00%

 

 

Nitrogen

-

< 750 ppm

< 24 ppm

 

 

Oxygen

< 30 ppm

< 150 ppm

< 6 ppm

 

 

Tetrafluoromethane

-

-

< 10 ppm

 

 

Moisture

< 20 ppm

< 80 ppm

< 10 ppm

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Valve Material

Brass

Brass

Brass

 

 

CGA Connection

660

660

660

 

 

 

Applications

Halocarbon C318 is used for plasma etching. When Halocarbon 318 is exposed to the RF field generated in the etch process, a gas plasma is produced that will etch silicon compounds with excellent selectivity.Semiconductor; etching of silicon oxides & CVD/PECVD chamber clean, propellant and aerating agent in foamed or sprayed food products, dielectric blend with SF6, media of polymerization of fluorine-contained polymers.

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WUHAN NEWRADAR SPECIAL GAS CO.,LTD Tel:86-27-82653381 E-mail: vicky@nrdgas.com MSN:vickyy8930@hotmail.com
Address: Wuhan City, Hubei Province, China Jiang Road , Special No.1 Building, Room 803