Product nameCarbon Tetrafluoride CF4 R14
Grade Standard: Electron Grade, Industrial Grade, Medicine GradeMSDS
|Other names :|
|Formula weight :||88|
|CAS No:|| 75-73-0|
COA of CF4 Gas:
|Total Impurities||≤10 ppm|
|Package Size：||47Ltr Cylinder|
|QTY Loaded in 20'Container：||200Cyls|
1. Used in plasma etching process of various integrated circuits, also used as laser gas, used as coolant of cryogenic refrigerants, solvents, lubricants, insulating materials and infrared detector tubes.
2. The dosage in the microelectronics industry is the largest plasma etching gas, methane four fluorine high purity gas and four fluorine high purity, high purity oxygen mixture gas, methane can be widely used in silicon, silica, silicon, phosphorus silicon nitride thin film material such as glass and tungsten etching, in electronic components surface cleaning, the solar cell production, laser technology, cryogenic refrigeration, leak test, printed circuit also heavily used in the production of detergent, etc.
3. Plasma dry etching technology used as cryogenic refrigerant and integrated circuit.